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Method For Manufacturing Silicon Ink Jet Nozzles

IP.com Disclosure Number: IPCOM000054474D
Original Publication Date: 1980-Feb-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Nepela, DA Wayne, VA [+details]

Abstract

A process for manufacturing silicon ink jet nozzles 10 for close spacing is shown. The process for manufacturing silicon nozzles by etching on the (111) crystallographic plane has previously been used. This etching process produces truncated pyramids which expand equally in both directions, thereby forming a square at the back side of the nozzle and a smaller square at the orifice side of the nozzle.