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Eliminating Structural Surface Defects During Josephson Junction Fabrication

IP.com Disclosure Number: IPCOM000054487D
Original Publication Date: 1980-Feb-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Mohr, TO Latta, E Walter, W [+details]

Abstract

For preparing Josephson junctions a base electrode of, e.g., niobium is deposited on a substrate. A RF-sputter cleaning step is required before the tunnel layer can be produced. The tunnel layer in turn undergoes plasma treatment before the top electrode is deposited on it.