Browse Prior Art Database

Removal of Photoresist

IP.com Disclosure Number: IPCOM000054603D
Original Publication Date: 1980-Mar-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Franchak, NP Funari, J Rivenburgh, DL [+details]

Abstract

This process relates to the non-chemical removal of photoresist during the fabrication of printed circuit modules whereby the use of organic solvents is eliminated.