Sputtered Metal Lift Off Process
Original Publication Date: 1980-Mar-01
Included in the Prior Art Database: 2005-Feb-13
Previous attempts to sputter metal into the lift-off photoresist structure presently used to define the land (stripe) metallurgy were not successful because the sputtered metal coated the "sidewalls" of the photoresist structure. This inhibited the ability of the photoresist structure to lift-off and leave behind a sharp, clearly defined metal land structure.