Browse Prior Art Database

Method for Measuring Sodium Contamination in MOS Structures

IP.com Disclosure Number: IPCOM000054649D
Original Publication Date: 1980-Mar-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Kerr, DR [+details]

Abstract

A method is described which directly measures the ion flow with digital coulomb meter, while avoiding displacement current and ion redrift contributions by proper choice of voltage waveform and reading times. The principle of the measurement may be understood with reference to the metal 3-silicon dioxide 2-silicon 1 (MOS) measurement structure of Fig. 1 and the bias voltages applied to the structure versus time (Fig.2).