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Improved Device for Photographic Mask and Wafer Protection

IP.com Disclosure Number: IPCOM000054731D
Original Publication Date: 1980-Mar-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Cheng, S Chiu, YF Cuomo, JJ Derr, DB [+details]

Abstract

A device is described for protecting projection masks and pre-exposed wafers from particulates and includes a rigid plastic membrane mounted on a mask or wafer. This rigid membrane also is a mechanical protection of the photographic mask and pre-exposed wafers. The membrane is an ion-implanted transparent plastic which has been etched to increase its transparency.