Improved Device for Photographic Mask and Wafer Protection
Original Publication Date: 1980-Mar-01
Included in the Prior Art Database: 2005-Feb-13
A device is described for protecting projection masks and pre-exposed wafers from particulates and includes a rigid plastic membrane mounted on a mask or wafer. This rigid membrane also is a mechanical protection of the photographic mask and pre-exposed wafers. The membrane is an ion-implanted transparent plastic which has been etched to increase its transparency.