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10X Segment Verification Disclosure Number: IPCOM000054795D
Original Publication Date: 1980-Apr-01
Included in the Prior Art Database: 2005-Feb-13

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DiFazio, JJ Lowry, RV Zingerman, J [+details]


A second pattern generator is qualified after one qualified pattern generator is available by the following procedure: 1. Data is used to generate a 10X segment in a pattern generator known to be qualified. 2. This same data is used to generate a 10X segment in a generator of unknown qualification. 3. These two segments are used to step an array on a photo repeater with the chips generated by each segment placed on intervals which will permit a defect inspection machine, capable of determining anomalies to less than 2 micro meters in size (such as a KLA-100 marketed by KLA Instrument, Corp.,) to compare the chips made from the two different segments. 4.