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A method for forming patterns of thin insulating films uses the same photoresist mask to etch an insulating layer, such as alumina, and a second layer, such as titanium.
English (United States)
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Lift-Off and Etching Technique
A method for forming patterns of thin insulating films uses the same
photoresist mask to etch an insulating layer, such as alumina, and a second
layer, such as titanium.
The steps of the process include the sputter deposition of a film of aluminum
oxide. Excess aluminum oxide is lifted off and cleaned with a solvent. The layer
of titanium is then etched off the pad, the photoresist is removed, and the pad is
cleaned with a solvent.
The etching and lift-off are both performed with the same photoresist mask,
thereby saving time and cost. The process also provides better quality parts due
to decreased ultrasonic action, resulting in less fragmentation and no
delamination of the aluminum oxide layer.