Lift Off Process for Precisely Defined Geometry
Original Publication Date: 1980-Apr-01
Included in the Prior Art Database: 2005-Feb-13
A lift-off process was previously disclosed [*] which provided a deposit of material on a substrate with clean edges that are free of fences or flags. The process provides for a resist pattern without undercut, for depositing an excess amount of metal or dielectric, and for etching back to remove scattered material from the resist walls.