Barrel Type Plasma Etching and Deposition System
Original Publication Date: 1980-Apr-01
Included in the Prior Art Database: 2005-Feb-13
Non-uniform etching and deposition behavior has been frequently observed in batch-processed wafers, particularly when the wafers were arranged on a flat horizontal disc (radial dependence of etch rate). It is suggested here to mount the wafers on the surface of a barrel-like holder contained in a reaction tube similar to the situation encountered in barrel-type epi reactors.