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Data Zoning in the Proximity Effect Correction Technique

IP.com Disclosure Number: IPCOM000054931D
Original Publication Date: 1980-Apr-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Parikh, M [+details]

Abstract

This is a computational technique for reducing computational time and the storage requirements for the solution to a system of linear equations that arise in the proximity-effect correction technique in electron-beam (E/B) lithography. The proximity-effect correction technique involves the solution of: (See Original) for the m unknowns (n(o)J); the matrix elements 'x(IJ)' are four dimensional integrals over the region A and A : (See Original)