Proton Implantation Process for Reducing Alpha Induced "Soft Errors"
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13
The ionization resulting from the passage of a single alpha particle can result in sufficient charge collection by very small devices to upset them. A damaged layer, introduced by proton implantation, interferes with the collection process, thus reducing device sensitivity to alpha particles.