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Proton Implantation Process for Reducing Alpha Induced "Soft Errors" Disclosure Number: IPCOM000054995D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

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Masters, BJ [+details]


The ionization resulting from the passage of a single alpha particle can result in sufficient charge collection by very small devices to upset them. A damaged layer, introduced by proton implantation, interferes with the collection process, thus reducing device sensitivity to alpha particles.