Browse Prior Art Database

Modified Process for Merging Subcollector Isolation Masks

IP.com Disclosure Number: IPCOM000055000D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Abbas, SA [+details]

Abstract

Typically, in bipolar semiconductor fabrication, two separate masking steps are required to define the subcollector and isolation regions. Techniques are described here for merging the subcollector and isolation masks.