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Modified Process for Merging Subcollector Isolation Masks Disclosure Number: IPCOM000055000D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

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Abbas, SA [+details]


Typically, in bipolar semiconductor fabrication, two separate masking steps are required to define the subcollector and isolation regions. Techniques are described here for merging the subcollector and isolation masks.