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Method for Measuring Silicon Substrate Temperature within an RF Plasma Environment

IP.com Disclosure Number: IPCOM000055013D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Logan, JS Schaible, PM Schwartz, GC Tan, SI [+details]

Abstract

Described here is a method for measuring silicon substrate temperature within an RF plasma environment.