Contrast Reversal in Resists Used for Electron Beam Projection Systems
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13
The photoresists used for high resolution electron-beam lithography preferably of the positive type, i.e., resists whose development rate increases in the exposed areas. This preference is due to the fact that positive resists have a higher resolution, a better adherence and a greater stability.