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Contrast Reversal in Resists Used for Electron Beam Projection Systems

IP.com Disclosure Number: IPCOM000055027D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Bohlen, H Greschner, J Nehmiz, P [+details]

Abstract

The photoresists used for high resolution electron-beam lithography preferably of the positive type, i.e., resists whose development rate increases in the exposed areas. This preference is due to the fact that positive resists have a higher resolution, a better adherence and a greater stability.