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Automated Resist Development Using Exposure Wedge

IP.com Disclosure Number: IPCOM000055073D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Grobman, WD Speth, AJ [+details]

Abstract

Continuous in situ monitoring of resist development is possible by exposing a rectangular monitoring region of the resist with an exposure dose which gradually varies along its length and then continuously scanning the rectangular exposure "wedge" during development with a laser beam.