Browse Prior Art Database

Mask Inspection Using Electron Beam Systems

IP.com Disclosure Number: IPCOM000055104D
Original Publication Date: 1980-May-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Grobman, WD [+details]

Abstract

Masks which are opaque to an electron beam (such as chrome masks) may be inspected with an electron beam system by raster scanning an electron beam over the mask, collecting a video signal, and detecting opaque or transparent defects by computer analysis thereof. Two types of mask errors may be detected while edge uncertainty or roughness may be accounted for by defining a region about each edge in which the presence or absence of mask material is not considered an error.