Browse Prior Art Database

Repair of Chromium Devices

IP.com Disclosure Number: IPCOM000055303D
Original Publication Date: 1980-Jun-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Mansbridge, DS Morgan, WM [+details]

Abstract

Chromium masks employed in the manufacture of large-scale integrated circuits are themselves made photolithographically. Typically, the mask pattern is defined in a photoresist layer, over a layer of chromium on glass, by projection of a reduced image of an artwork or by electron beam writing. Chromium is then etched away in the pattern defined by the photoresist.