Repair of Chromium Devices
Original Publication Date: 1980-Jun-01
Included in the Prior Art Database: 2005-Feb-13
Chromium masks employed in the manufacture of large-scale integrated circuits are themselves made photolithographically. Typically, the mask pattern is defined in a photoresist layer, over a layer of chromium on glass, by projection of a reduced image of an artwork or by electron beam writing. Chromium is then etched away in the pattern defined by the photoresist.