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Repair of Chromium Devices Disclosure Number: IPCOM000055303D
Original Publication Date: 1980-Jun-01
Included in the Prior Art Database: 2005-Feb-13

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Mansbridge, DS Morgan, WM [+details]


Chromium masks employed in the manufacture of large-scale integrated circuits are themselves made photolithographically. Typically, the mask pattern is defined in a photoresist layer, over a layer of chromium on glass, by projection of a reduced image of an artwork or by electron beam writing. Chromium is then etched away in the pattern defined by the photoresist.