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Poly(p-Vinyl Phenol) and Brominated Poly(p-Vinyl Phenol) as Host Resins for Electron Beam Resists

IP.com Disclosure Number: IPCOM000055499D
Original Publication Date: 1980-Jul-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Hiraoka, H [+details]

Abstract

An electron beam resist with high electron beam sensitivity can be formulated with poly(p-vinyl phenol) and the diester of dihydroxy benzophenone of o-naphthoquinone-1-diazide-5-sulfonic acid. Brominated poly(p-vinyl phenol) has enhanced cross-linking reactions under electron beam exposures, which may be used for reversed image generations with electron beam-flood UV-exposures.