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Multicomponent Film Deposition by Target Biasing

IP.com Disclosure Number: IPCOM000055521D
Original Publication Date: 1980-Jul-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Cuomo, JJ Harper, JM [+details]

Abstract

A multicomponent film deposition technique is described wherein a single ion source is used to sputter two or more targets of composition A(1) B(1) ... to produce multicomponent films A(x) B(y) ... with the composition controlled by simple biasing of the target.