Browse Prior Art Database

Trace Chlorine Monitor

IP.com Disclosure Number: IPCOM000055608D
Original Publication Date: 1980-Aug-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Carr, TW Gajda, JJ [+details]

Abstract

A mechanical device 1 monitors the active chlorine levels on semiconductor production lines. Device 1 has exposed Al(2)Cu intermetallics 2 on blanket A1-Cu 3 films formed on silicon wafer 4. A large metal Plate 5 of, for example, molybdenum is clamped to the back of wafer 4 by molybdenum ring clamp 6 and springs 7 to the back of the silicon wafer on which the Al-Cu film has been deposited. In this way a large galvanic cell is constructed in which the Al-Cu film is very prone to chlorine corrosion. It has been established that this type of device will accelerate the corrosion rate of Al-Cu films by a factor of 200X. In other words, this device will corrode 200 times faster than the Al-Cu films normally deposited in the process of semiconductor fabrication.