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Wafer Temperature Measurement in Epitaxial and Pyrolytic Deposition Equipment

IP.com Disclosure Number: IPCOM000055635D
Original Publication Date: 1980-Aug-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Bronchard, JP Gaillard, J Pateyron, A Perrois, P [+details]

Abstract

In standard epitaxial and silicon nitride deposition equipment, like the AMC 7600 manufactured by Applied Materials Inc., the temperature measurement is performed through 3 photodiodes located inside the SiC-coated graphite susceptor.