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Methods for Pattern Formation of Polyacetylene Films. Films

IP.com Disclosure Number: IPCOM000055687D
Original Publication Date: 1980-Aug-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Gill, WD Marek, J [+details]

Abstract

Many potential applications of polyacetylene, (CH), films in the metallic or semiconducting states will require pattern formation of the active material. Because of the open structure of these films (density approximately equal 0.4), conventional selective doping techniques may be severely limited.