Browse Prior Art Database

Methods for Pattern Formation of Polyacetylene Films. Films Disclosure Number: IPCOM000055687D
Original Publication Date: 1980-Aug-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue


Related People

Gill, WD Marek, J [+details]


Many potential applications of polyacetylene, (CH), films in the metallic or semiconducting states will require pattern formation of the active material. Because of the open structure of these films (density approximately equal 0.4), conventional selective doping techniques may be severely limited.