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Fabrication of In-Au Resistor Films with improved Reproducibility

IP.com Disclosure Number: IPCOM000055731D
Original Publication Date: 1980-Aug-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Lahiri, SK [+details]

Abstract

Thin film resistors for use at 4.2 degrees K can be fabricated using sequentially deposited layers of In and Au, which form intermetallic compounds with each other.