Fine Line Measurement System for a Scanning Electron Microscope
Original Publication Date: 1980-Sep-01
Included in the Prior Art Database: 2005-Feb-13
The system shown in the figure enables direct, high-accuracy and repeatable measurement of micron and submicron lines. The system solves the problem of drift magnification inherent in the scanning electron microscope (SEM), and thus eliminates the need for continual manual SEM calibration to a known standard.