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Precision Aluminum Etching Disclosure Number: IPCOM000055856D
Original Publication Date: 1980-Sep-01
Included in the Prior Art Database: 2005-Feb-13

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Kahwaty, VN Ronkese, BJ Smith, MC [+details]


This arrangement provides a means of achieving an aluminum pattern 10 of a specific resistance at a specific temperature on a wafer 12. The result is a resistance thermometer on a chip surface. For example, pure aluminum is used which has a temperature coefficient of resistivity of approximately 0.39 percent/degrees C.