Browse Prior Art Database

Negative Acting Positive Photoresist

IP.com Disclosure Number: IPCOM000055977D
Original Publication Date: 1980-Oct-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Hamel, CJ Schuele, WJ Symula, EG [+details]

Abstract

This method provides an improved negative-acting photoresist suitable for lift-off deposition of interconnection metallurgy in integrated circuit processing.