Resistance and Dimension Characterization Via Kerf Automatic in Line Tests
Original Publication Date: 1980-Oct-01
Included in the Prior Art Database: 2005-Feb-13
In VLSI (very large-scale integration) technologies, the electrical behavior of any device (resistor, diode, transistor) strongly depends not only on the process (vertical) profile, but also on the geometrical (horizontal) dimensions. The dimension tolerances can even dominate over process tolerances.