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A high resolution projection photolithography system employing a conjugate wave generator 12 is shown in the drawing.
English (United States)
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High Resolution Projection Photolithography System Employing Conjugate
A high resolution projection photolithography system employing a conjugate
wave generator 12 is shown in the drawing.
An input beam of light 14 from a light source (not shown) passes through a
condensor system 16 to form an illuminating beam 18 which uniformly illuminates
the back side of an opaque mask 20. The mask 20 has clear apertures therein
which provide the desired photolithographic pattern.
This patterned or object beam 22 propagates through a partially reflecting
high quality (lambda/100) beam splitter cube 24 into the conjugate wave
generator 12. The generator 12 has an aperture sufficient to accept virtually all
of the light diffracted from the apertures of the mask 20, and it (12) is operated
with phase conjugate pump beams 26 and 28.
The conjugate wavefront 30 generated by degenerate four wave mixing
propagates back toward the mask 20, but it (30) is intercepted by the beam
splitter 24 so that it (30) impinges on the wafer 32. If the optical path from the
mask 20 to the generator 12 is exactly equal to the distance from the wafer 32 to
the generator 12, the intensity pattern on the wafer 32 is identical to that
transmitted through the mask 20.
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