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Apparatus for Removing Particulate from Substrate to be Coated

IP.com Disclosure Number: IPCOM000056174D
Original Publication Date: 1980-Nov-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Grivjack, S Scarafino, AJ [+details]

Abstract

The sputtered or evaporation of coatings of metals or dielectric on glass, ceramic or silicon is a common practice in the industry today. Such coatings are commonly applied by in-line sputtering or evaporation vacuum systems which are widely used in the technology produced in film coating. One of the major problems in producing such thin film coatings is pin hole density caused primarily by particulate matter on the face of the substrate prior to coating.