Browse Prior Art Database

Mask Alignment Technique

IP.com Disclosure Number: IPCOM000056180D
Original Publication Date: 1980-Nov-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Byrne, TM Christensen, RG [+details]

Abstract

A mechanical alignment system is provided for accurately aligning each side of a semiconductor wafer, or the like, with a mask. This is achieved by utilizing a pair of reference pins mounted in an alignment ring for supporting a mask and wafer. Both the mask and wafer have a registration notch comprising a pair of registration surfaces for receiving one of the pins and a banking surface for receiving the other pin through the force of gravity. Once the mask and wafer are aligned via gravity, a vacuum arrangement clamps mask and wafer together. The function of the pins may be interchanged to permit the wafer to be flipped over for double-sided metallurgy without loss of orientation.