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Amorphous SiC Films for Passivation Applications

IP.com Disclosure Number: IPCOM000056278D
Original Publication Date: 1980-Nov-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Guarnieri, CR Lee, W Richardson, RE Wieder, H [+details]

Abstract

Films of an amorphous alloy of silicon carbon, depositable at a relatively low temperature, are useful as passivation layers to provide resistance to corrosion in semiconductor devices and magnetic disks and heads.