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Metal Containing Polymer Films Formed by Simultaneous Etching and Polymerization

IP.com Disclosure Number: IPCOM000056281D
Original Publication Date: 1980-Nov-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Coburn, JW Kay, E [+details]

Abstract

Metal-containing polymer films can be made in a glow discharge system in which the metal is injected into the plasma by etching the negatively biased excitation electrode and is incorporated into a polymer film being deposited simultaneously on the ground plane opposite the metal electrode. This simultaneous etching-polymerizing technique produces uniform thermally and chemically stable good quality films over large areas and is easily implemented in existing planar discharge systems. It was anticipated that the metal content of the films fabricated in this way could be easily manipulated by varying one or more of the discharge parameters (e.g., RF power). However, subsequent experiments have shown that the metal content is essentially independent of discharge parameters, such as RF power and discharge gas pressure.