Browse Prior Art Database

Linewidth Control with Image Reversal

IP.com Disclosure Number: IPCOM000056383D
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Moritz, H [+details]

Abstract

With monochromatic exposure tools, strong linewidth variations occur on the topology of a semiconductor substrate. These variations are caused by substrate reflection. The image in a thin top layer of photoresist can be produced with little or no variation by utilizing a thick, highly absorbing bulk material between the thin top layer and the semiconductor substrate.