Linewidth Control with Image Reversal
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-14
With monochromatic exposure tools, strong linewidth variations occur on the topology of a semiconductor substrate. These variations are caused by substrate reflection. The image in a thin top layer of photoresist can be produced with little or no variation by utilizing a thick, highly absorbing bulk material between the thin top layer and the semiconductor substrate.