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Linewidth Control with Image Reversal Disclosure Number: IPCOM000056383D
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-14

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Moritz, H [+details]


With monochromatic exposure tools, strong linewidth variations occur on the topology of a semiconductor substrate. These variations are caused by substrate reflection. The image in a thin top layer of photoresist can be produced with little or no variation by utilizing a thick, highly absorbing bulk material between the thin top layer and the semiconductor substrate.