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End Point Detection of Resist Development Fiducial Dosage Adjustment

IP.com Disclosure Number: IPCOM000056406D
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Babie, WT Bushnell, LP Fredericks, EC Lane, JG Pyle, R [+details]

Abstract

The laser end-point detection of resist development on fiducial squares is conformed to pattern development, so that no extended development time past the determined end point is needed. This can be accomplished either by a reduced exposure dosage in the fiducial area or by using a series of lines and spaces in the fiducial area rather than a blanket exposure. The technique can be used with various radiations, such as E-beam, X-ray, and light. The dosage adjustment is chosen by computer modelling to provide a fiducial end point which conforms to the size of the pattern features which are to be developed.