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Improved Resist Resolution Using Short UV Exposure

IP.com Disclosure Number: IPCOM000056416D
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Narasimham, MA Raniseski, JW [+details]

Abstract

Improved photoresist resolution is provided by exposing positive resists in the short UV (ultraviolet) spectral region around 3100 Angstroms.