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Getter Sputtering Apparatus With Perforated Cathode

IP.com Disclosure Number: IPCOM000056801D
Original Publication Date: 1988-Feb-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Bauer, HJ [+details]

Abstract

An apparatus is described for getter sputtering active gases in a vacuum chamber by reacting these gases with a material having a high affinity to oxygen. The apparatus 1 consists of a cathode 2 shaped as a cylinder and made of perforated sheet metal having a high affinity to oxygen. Cathode 2 faces a ground shield 4 and an anode 3 on either side. Sputtering takes place in the space between the anode and the cathode but is suppressed by ground shield 4 on the cathode surface facing the workpieces. Ground shield 4, which is also perforated, ensures a good gas flow and prevents the workpieces on holder 5 from being contaminated by getter material. Fig. 1 is a schematic of getter sputtering apparatus 1.