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Pattern Writing With Laser Evaporation of Metals

IP.com Disclosure Number: IPCOM000056947D
Original Publication Date: 1988-Feb-01
Included in the Prior Art Database: 2005-Feb-14

Publishing Venue

IBM

Related People

Authors:
Lankard, JR Lankard, JR [+details]

Abstract

A proposal suggests the use of local laser evaporation to transfer metal patterns or writings from a template to a semiconductor substrate.1 The procedure, which takes place under vacuum, can be achieved with no damage or contamination of the substrate. The method proposed is not laser engraving, but a way to write with metals using a laser. The method is described, referring to the figure, wherein the carrier substrate 1 and the receiving substrate 2 are located in a vacuum chamber 3 with a window opening 4 to accommodate the laser beam. The metal film 5 being transferred is located facing the substrate surface 6 which is to be written upon. A laser beam 7 of appropriate intensity, fluence, and pulse duration irradiates a mask 8 containing the pattern to be projected upon the receiving substrate.