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Carbonized Resist As Directly-Patternable Mask Absorber

IP.com Disclosure Number: IPCOM000057174D
Original Publication Date: 1988-Mar-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Cohen, SH Lin, BJ Sedgwick, TO Vladimirsky, Y [+details]

Abstract

Patterned chromium on quartz or glass has been the absorber for photolithography. It provides a large contrast with less than 100 nm thickness. Because of its hardness and good adhesion on the substrate, chromium masks are also known to be durable and can be repeatedly cleaned. However, in order to pattern the chromium layer, an extra (Image Omitted) pattern transfer step is required which leads to an image bias that can be problematic when the feature size approaches submicrometer. Furthermore, the chromium coating process requires evaporation or sputtering in vacuum under extremely clean situations and is very costly.