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Contrast Enhancement of Resist Images by Surface Crosslinkage

IP.com Disclosure Number: IPCOM000058066D
Original Publication Date: 1988-Aug-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Chiong, KN Hinsberg, W Hiraoka, H [+details]

Abstract

Enhanced contrast of resist images is achieved by having surface crosslinked layers of a few thousand Angstrom thickness, which defines the top image surfaces, having a bulk of resist images formed in a conventional way of each lithographic mode, including optical, electron beam or X-ray lithography. Surface crosslinking can be carried out in many ways, for example by UV-flood exposure, low energy electron flood exposure or ion beam flood exposure. For UV-flood exposure, the presence of crosslinking agents in a sufficient concentration on the surface is important. For this purpose, 4,4'-diazido diphenylsulfide is used.