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METAL ALLOY TARGETS FOR SPUTTERING OF HIGH Tc (Y-Ba-Cu-O) FILMS

IP.com Disclosure Number: IPCOM000058308D
Original Publication Date: 1988-Oct-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Chi, CC Scheuermann, M Tsuei, C [+details]

Abstract

Sputtering the new high Tc superconducting materials has proved to be somewhat difficult. Several techniques have been tried with limited success. The most successful deposition techniques so far have been using triple E-beam evaporation or sputtering using oxide targets or three metal targets. The deposition process can be simplified and made more controlled by reducing the number of sources. For the E-beam case, this is somewhat difficult since the melting temperatures of the elements involved are considerably different. Initial work sputtering from a single oxide target suffered from low sputtering rate due to the presence of a heavy concentration of negative oxygen ions. This effect is minimized by using metal alloy targets and directly spraying oxygen onto the substrates.