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Laser Deposition of Metal Films With Organo-Metal Ink

IP.com Disclosure Number: IPCOM000058684D
Original Publication Date: 1988-Dec-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Fan, B Krauss, T Oprysko, MM [+details]

Abstract

A technique is described whereby a thin metal film is deposited on a substrate by means of laser-driven pyrolytic decomposition of a mixture of organo-metal inks. The technique is an improvement over previous deposition processes in that, by using organo-metal ink, the deposition can be performed at room temperatures and pressures and the result is a highly conductive, adhesive, and durable thin metal film which can used in applications, such as integrated circuit wiring, X-ray mask pattern repair, etc. Typically, laser-driven chemical vapor deposition (LCVD) of metals is considered practical for applications, such as the repair of integrated circuits, metallurgy, X-ray mask patterns, wiring in electronic packages, writing of discretionary wiring (engineering changes), etc.