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Triangular-Shaping Apertures for Electron Beam Lithography

IP.com Disclosure Number: IPCOM000058822D
Original Publication Date: 1988-Dec-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Ho, CT Langner, GO [+details]

Abstract

This article suggests a means of improving the aperture in electron beam lithography so as to minimize side effects of multiple aperture configurations and which will also define a design criterion. The method proposed specifies an aperture configuration which permits alignment servoaction, eliminates spot overlap, and minimizes deflection amplitudes. (Image Omitted) The suggested aperture configuration utilizes a variable-shaped spot E-beam lithography system. This generally projects the image of one-shaping aperture onto a second, moving the position of the projected image by means of electron optical deflection. The shape of the spot in the target plane is determined by the area through which the electron beam can pass.