Solubilizing the Reaction Products During Electrochemical Etching of Molybdenum
Original Publication Date: 1988-Jan-01
Included in the Prior Art Database: 2005-Feb-15
A proposal suggests the addition of a specific oxidizing agent to the anodic etching solution used in the preparation of metal masks for semiconductor processing operations. A 1% by weight of sodium persulfate added to the sulfuric acid-phosphoric acid etch solution permits the etching to proceed at a uniform rate resulting in straight wall images.