Modified Image Reversal Resist Diffusion Bake
Original Publication Date: 1988-Feb-01
Included in the Prior Art Database: 2005-Feb-15
A significant improvement in MIRP resist developed image profile prior to metallization is achieved by careful control of resist solvent content, pre-exposure bake temperature and ramp-up time to temperature. Necking of resist spaces and excessive undercutting of lift-off profiles are both reduced.