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Defect Analyses Using a Clear Mask With a Pellicle Disclosure Number: IPCOM000059092D
Original Publication Date: 1988-May-01
Included in the Prior Art Database: 2005-Feb-15

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Related People

Abramovich, KM Benoit, SL Kazak, FW [+details]


A clear mask, complete with a protective pellicle, is used in the evaluation of contributions to defects from processing and handling in a given photoprocessing step per se.