Browse Prior Art Database

Defect Analyses Using a Clear Mask With a Pellicle

IP.com Disclosure Number: IPCOM000059092D
Original Publication Date: 1988-May-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Abramovich, KM Benoit, SL Kazak, FW [+details]

Abstract

A clear mask, complete with a protective pellicle, is used in the evaluation of contributions to defects from processing and handling in a given photoprocessing step per se.