Browse Prior Art Database

Constant Heat Reservoir

IP.com Disclosure Number: IPCOM000059201D
Original Publication Date: 1988-Jun-01
Included in the Prior Art Database: 2005-Feb-15

Publishing Venue

IBM

Related People

Authors:
Harper, JME Logan, JS [+details]

Abstract

Improved temperature control can be maintained during fabrication of very large-scale integrated circuit wafers by supporting the wafers in contact with a reservoir that either absorbs or emits heat at a constant temperature during processing due to a phase change of encapsulated material.