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The temperature of semiconductor wafers can be determined to a high degree of accuracy without contact by sensing the changes in reflectivity of light at the wafer surface due to temperature.
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Temperature Sensing of Semiconductor Wafer
The temperature of semiconductor wafers can be determined to a high
degree of accuracy without contact by sensing the changes in reflectivity of light
at the wafer surface due to temperature.
Referring to the figure, semiconductor wafer 1 passes through flash annealer
2 using halogen lamps 3 to raise the wafer temperature and activate ion
implantation or produce contact alloying. The wafer is illuminated by light from
laser 4 passing through chopper 5 and beam splitter 6 normal to the surface of
the wafer. Light reflected from the surface of the wafer is diverted by splitter 6 to
amplifier-detector 7 and readout device 8. The amount of reflectance is then
compared to previous calibration values. Chopper 5 assures that stray light from
lamps 3 will not affect the measurement.