High Accuracy Calibration Tooling for Photoplotting System
Original Publication Date: 1988-Oct-01
Included in the Prior Art Database: 2005-Feb-16
A method has been devised to improve mask generation required to provide more precise feature definition. The proposal suggests incorporating an optical standard into the generated mask itself, using this as a reference in further operations. Accuracy is improved from +5 mil to + 0.3 mil.