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High Accuracy Calibration Tooling for Photoplotting System Disclosure Number: IPCOM000059445D
Original Publication Date: 1988-Oct-01
Included in the Prior Art Database: 2005-Feb-16

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Brophy, DJ Grosso, J Jones, SA Stokrocki, R Weigel, W Will, DG [+details]


A method has been devised to improve mask generation required to provide more precise feature definition. The proposal suggests incorporating an optical standard into the generated mask itself, using this as a reference in further operations. Accuracy is improved from +5 mil to + 0.3 mil.