Multiple, Rapid-Scan, Electron Beam Exposure
Original Publication Date: 1988-Nov-01
Included in the Prior Art Database: 2005-Feb-16
By repeatedly scanning and exposing a pattern in photoresist with an electron beam which is scanned at a high speed, a total dose sufficient to create the pattern image is applied in about the same time as required for single scan image formation. This technique results in averaging random noise, e.g., from mechanical vibration and from electromagnetic sources. Thus, a smaller electron beam spot may be used and smaller image sizes may be reliably formed without substantially decreasing throughput of an electron beam exposure tool.